Bipolar Pulsed Dc Power Supply

The capacitor charging high voltage dc power supplies are designed specifically to the requirements of capacitor charging or capacitor conditioning i e.

Bipolar pulsed dc power supply.

The rpdg line eliminates yield limiting factors thus enabling existing pvd tools to produce the high quality low defect films needed for next. The cp20 series from puls stands for efficient and compact 24v 20a 1 phase din rail power supplies. The bipolar pulsed power supply is a modular designed system consisting of the dc power unit and the bipolar pulse unit which switches the voltage with a freely adjustable pulse of. Mks rpdg generators provide asymmetric bipolar and unipolar pulsed dc power for reactive pvd physical vapor deposition cvd chemical vapor deposition bias and enhancement coating applications.

They have a more heavily designed output resistor to withstand a pulsed load and a regulating circuit optimized for fast switching over between current and voltage regulation and vice versa. Advanced energy pinnacle plus power supplies provide all the advantages of a pulsed dc solution for reactive processes in an easily integrated package that increases process efficiency reduces costs and offers superior flexibility and latitude. Combining standard dc technology and our patented pulsed dc technology the pinnacle plus power supplies provide higher deposition rates. Since the second half of 2006 we developed our own design of asymmetric bipolar pulsed bias power supply.

Ac bipolar pulsed power supply for reactive magnetron sputtering article pdf available in ieee transactions on plasma science 39 10 1983 1989 november 2011 with 529 reads how we measure. Achieve new levels of process performance using field proven bipolar dc pulsing technology. Advanced waveform control allows process fine tuning. With the new cp20 248 the manufacturer from.

Bipolar pulsed power supplies model magpuls bp the bipolar pulsed power supplies model magpuls bp are constructed for plasma excitation with highest performance. An asymmetric bipolar pulsed dc power supply and a dc power supply were used to sputter si and ti targets respectively in ar n2 plasma. Structural characterization of the coatings was done. The power supply works as a voltage source negative pulse amplitude can be adjusted in the range of 20 to 200v dc the positive pulse amplitude is within the range of 15 to 50v dc and is proportional to the negative pulse current magnitude.